O Ministry of Industry and Information Technology of China (MIIT) announced the development of a machine deep ultraviolet lithography (DUV)capable of manufacturing chips of 8 nanometers and below. The technology is part of an effort for its wider application in the industrial sector.
On September 9, MIIT released the “Catalogue for the Promotion and Application of Main Technical Equipment (2024 Edition)” on its official website.
The document suggests that local governments coordinate support policies in the areas of industry, finance and technology, highlighting the importance of technical equipment for national security.
MIIT defined that the main technical equipment are those that bring significant advances in the country and have intellectual property rights, but still do not have great market performance.
Among the items listed, the DUV lithography machine stands out, with technical specifications such as a wafer diameter of 300mm, wavelength of 248nm, resolution of up to 65nm and overlay accuracy of 8nm.
The development of this machine was carried out by leading semiconductor companies such as Advanced Micro-Fabrication Equipment Inc. (AMEC) and Shanghai Micro Electronics Equipment (SMEE)in addition to research institutions such as the Institute of Microelectronics, Chinese Academy of Sciences.
In recent days, the United States and the Netherlands have announced tighter restrictions on the export of lithography machines to China. Equipment such as the models DUV 1970i e 1980i of the company ASML will be affected by these measures, as reported by Reuters.
According to Central News Agencyif China can manufacture DUV machines for 8-nanometer chips domestically, it could reduce its dependence on ASML technologies. So far, there has been no official confirmation of this advance from the Chinese government or manufacturers.
Source: https://www.ocafezinho.com/2024/09/19/china-avanca-no-desenvolvimento-de-chips-de-8-nanometros-e-desafia-os-eua/
